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Lecturer(s)
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Křepelka Jaromír, Ing. CSc.
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Čada Martin, Mgr. Ph.D.
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Peřina Jan, prof. RNDr. Ph.D.
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Course content
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The aim of the subject is to acquaint students with the optical properties of thin films (TF) (isotropic, anisotropic, homogeneous, non-homogeneous) from dielectric and metallic materials and their applications based on a deeper understanding of physical principles. Attention is also paid to the properties of thick layers and their combinations with TF systems as well as layers in partially coherent light. The methods of TF preparation and control of their application are presented. The theoretical basis follows the solution of Maxwell equations for plane monochromatic wave, from which the transformation relations of the tangential components of the electric and magnetic field vectors are derived, allowing to define the amplitude and power macroscopic parameters: reflectivity and transmissivity. There are discussed theoretically interesting problems, such as the reversibility principle, the properties of symmetric TF systems, color effects on TF, the relation of TF to photonic crystals and waveguide structures, etc. Examples of practical designs of basic TV structures such as antireflective and highly reflective systems (and their combinations) are given, narrowband filters and polarizing filters. The principles of evaluation of ellipsometric measurements are mentioned. The student will also be informed about the principles of the basic deposition techniques of thin films and their optical and mechanical characterization. In terms of the subject the basic principles of thin films deposition using physical and chemical methods will be explained. Emphasis will be placed on the description of the physical vapor methods and their various modifications (e.g. e-beam, MBE) and on the description of low-temperature plasma sputtering methods. The course will also focus on the basic principles of deposition of thin films using chemical vapor deposition methods (CVD) with emphasis on plasma-assisted methods and other specialized CVD methods. The next aim of the subject is to acquaint students with the optical properties of thin films (TF) (isotropic, anisotropic, homogeneous, non-homogeneous) from dielectric and metallic materials and their applications based on a deeper understanding of physical principles. Attention is also paid to the properties of thick layers and their combinations with TF systems as well as layers in partially coherent light. The methods of TF preparation and control of their application are presented. The theoretical basis follows the solution of Maxwell equations for plane monochromatic wave, from which the transformation relations of the tangential components of the electric and magnetic field vectors are derived, allowing to define the amplitude and power macroscopic parameters: reflectivity and transmissivity. There are discussed theoretically interesting problems, such as the reversibility principle, the properties of symmetric TF systems, color effects on TF, the relation of TF to photonic crystals and waveguide structures, etc. Examples of practical designs of basic TV structures such as antireflective and highly reflective systems (and their combinations) are given, narrowband filters and polarizing filters. The principles of evaluation of ellipsometric measurements are mentioned. Furthermore, the methods of testing of mechanical and tribological properties of TF and coatings will be discussed. The theory of depth sensing indentation will be explained and basic contact scenarios for flat punch, spherical, conical and pyramidal indentor will be analyzed. Factors affecting the nanoindentation test will be discussed in details. The principles of the scratch test and the Pin-on-Disk test, as the fundamental tests for evaluation of adhesion-cohesion properties and wear, will be explained.
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Learning activities and teaching methods
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Monologic Lecture(Interpretation, Training), Work with Text (with Book, Textbook)
- Attendace
- 20 hours per semester
- Homework for Teaching
- 130 hours per semester
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Learning outcomes
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Students are assumed to master the topics described in the content of the subject.
The obtained knowledge is described and clearly defined in the content of the subject.
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Prerequisites
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The subject is oriented to gaining and improving knowledge.
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Assessment methods and criteria
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Mark
Research of the scientific literature, discussions about the studied topics.
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Recommended literature
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Bach, H., Krause, D. (Eds.). (1997). Thin films on glass.
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Baumeister, W. P. (2004). Optical coating technology. SPIE.
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D.M. Mattox. (2010). Handbook of physical vapor deposition (PVD) processing, 2nd ed.. Elsevier.
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Eckertová, L. (1974). Fyzika tenkých vrstev. SNTL, Praha.
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H. Angus Macleod:. (2010). Thin-Film Optical Filters. CRC Press.
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Holland, L. (1969). Vacuum deposition of thin films. Chapman & Hall, London.
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Kaiser, N., Pulker, H. K. (Eds.). (2003). Optical interference coatings. Springer.
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Knittl, Z. (1976). Optics of thin films. John Wiley & Sons, London - New York - Sydney - Toronto.
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Kochergin, V. (2003). Omnidirectional optical filters. Kluwers.
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Křepelka, J. (1993). Optika tenkých vrstev. Vydavatelství Univerzity Palackého v Olomouci, http://aix.volny.cz/~krepelka/films.htm.
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P. M. Martin. (2010). Handbook of Deposition Technologies for Films and Coatings. Elsevier.
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Vašíček, A. (1960). Optics of thin films. North Holland, Amsterdam.
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Weber, J. M. (2003). Handbook of optical materials. CRC.
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Willey, R. R., Dekker, M. (2002). Practical design and production of optical thin films.
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Willey, R. R. (2006). Field guide to optical thin films. SPIE.
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Yeah, Pochi. (2005). Optical waves in layered media. John Wiley & Sons.
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