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Lecturer(s)
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Peřina Jan, prof. RNDr. Ph.D.
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Hubička Zdeněk, Mgr. Ph.D.
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Čada Martin, Mgr. Ph.D.
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Course content
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" Vacuum technics fundamentals, methods of vacuum production and measurement, construction of vacuum apparatus. " Basic principles of the use of DC, RF, pulsed DC and HIPIMS power sources for plasma generation. " Fundamentals of experiment process control. " Fundamentals of thin film deposition methods: PVD, CVD and PECVD and their modification, comparison of advantages and disadvantages. " Magnetron sputtering, reactive sputtering, description of different configuration regarding plasma generation, application for particular thin film deposition " PECVD thin film deposition " Atmospheric plasma and its application for various thin film deposition and surface modification " Others plasma assisted thin film deposition methods and their practical use " Overview of plasma diagnostics methods, the Langmuir probe theory of charge particles collection with metallic probe with swept voltage bias, the construction of probe and measurement electronic circuits, the problematics of measurement in plasma deposition systems. " Hot emissive probe theory for real time plasma potential measurement, probes for the measurement of ion velocity distribution function (RFEA. Katsumata probe, etc.) probes for the measurement of ion flux and their use in technological plasma " Mass spectrometry with energy resolution, optical emission spectroscopy, laser absorption spectroscopy, microwave plasma diagnostics " Basic parameters of thin films, physics of surfaces and thin films, structure and composition of thin films, " Characterization of thin films - the basic principles of structure measurement and composition measurement. X-ray spectroscopy " Electron spectroscopy of thin films, SEM and TEM technics, other methods of electron spectroscopy, Raman spectroscopy, AFM, STM, indentation.
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Learning activities and teaching methods
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Monologic Lecture(Interpretation, Training), Work with Text (with Book, Textbook)
- Attendace
- 20 hours per semester
- Homework for Teaching
- 130 hours per semester
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Learning outcomes
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Students are assumed to master the topics described in the content of the subject. The aim of the course is to introduce fundamental knowledges to students in the field of vacuum technics, low temperature plasma, deposition and characterization of thin films. The course will focus on plasmatic methods of thin films deposition and plasma diagnostics.
The obtained knowledge is described and clearly defined in the content of the subject.
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Prerequisites
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The subject is oriented to gaining and improving knowledge.
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Assessment methods and criteria
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Mark
Research of the scientific literature, discussions about the studied topics.
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Recommended literature
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A. J. Dekker. (1958). Solid state physics. Prentice-Hall Englewood Cliffs.
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D.M. Mattox. (2010). Handbook of physical vapor deposition (PVD) processing, 2nd ed.. Elsevier.
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H. Czichos, T. Saito, L. Smith. (2006). Handbook of Materials Measurement Methods. Springer Verlag.
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L. Eckertová. (1996). Metody analýzy povrchů - elektronová mikroskopie a difrakce. Academia Praha.
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P. M. Martin. (2010). Handbook of Deposition Technologies for Films and Coatings. Elsevier.
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R. Hippler, H. Kersten, M. Schmidt, K.H. Schoenbach. (2007). Low-temperature plasma, 2nd ed.. Wiley-VCH.
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