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Lecturer(s)
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Hubička Zdeněk, Mgr. Ph.D.
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Potůček Zdeněk, Ing. Ph.D.
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Course content
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- Methods of preparation of thin films: vacuum steaming, arc evaporating, etc. - Application of low-temperature plasma for PVD and PECVD deposition of conducting and dielectric thin layers, physical basics of DC and RF cathode sputtering and reactive sputtering, RF, MF, DC, DC pulse and dual magnetron systems, systems with hollow cathode and plasma channel - Systems for PECVD deposition of thin layers, MW surfatron, ECR plasma, PECVD systems operating under atmospheric pressure, DBD discharge, RF discharge, BTD with flow channel - Properties and characterization of thin-layered structures - Angle-dependent spectral ellipsometry in the region of wavelengths including visible and vacuum-UV region of the spectrum - Phase transitions in thin-layered structures - Dielectric and piezoelectric properties and characterization of thin layers of perovskites - Characterization of mechanical parameters of thin-layered systems by means of nanoindentation, optically-excited surface acoustic waves, etc.
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Learning activities and teaching methods
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Lecture
- Attendace
- 30 hours per semester
- Homework for Teaching
- 20 hours per semester
- Preparation for the Exam
- 40 hours per semester
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Learning outcomes
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The lecture deals with problems of preparation, characterization and properties of thin film structures.
Application Apply knowledge of technology and characterization of photonic nanostructures in modern research and development.
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Prerequisites
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Prior knowledge of the undergraduate physics.
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Assessment methods and criteria
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Mark
Knowledge of the course topics, ability to discuss about the course topics in wider contexts Passing the examination
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Recommended literature
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Časopisecká a firemní literatura.
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Rieke, G.H. (2002). Detection of light. From the Ultraviolet to the Submillimeter. Cambridge Univ. Press, 2. edition, Cambridge.
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Saleh, B.E.A., Teich, M.C. (1994). Základy fotoniky. Matfyzpress, Praha, sv. 3.
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